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40nm

SMIC is the first foundry in mainland China to offer 40nm technology. SMIC offers its 40nm Low Leakage (LL) process with three threshold voltage core devices and 1.8V, 2.5V I/O options to meet various design application requirements. The 40nm logic process combines the most advanced immersion lithography, strain engineering technique, ultra shallow junction and ultra low-k dielectric for maximum power and performance optimization.

Features:

Core device options: 1.1V (LL)

Three different Vt level core devices for flexible design optimization

I/O device options: 1.8V, 2.5V (pure) with over drive and under drive capability

Single-port and dual-port SRAM bit cells associated with memory compilers

193nm immersion lithography for critical layers

Strain technique to enhance mobility

Millisecond anneal for ultra shallow junction

Up to 10M Cu/Low-k (k = 2.7)

Wire bond and flip chip options

外链出处

• 说那些话时候是去年